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Effect of B-doping on the morphological, structural and optical properties of SILAR deposited CuO films

dc.contributor.authorYüksel, M.
dc.contributor.authorPennings, J.R.
dc.contributor.authorBayansal, Fatih
dc.contributor.authorYeowad, John T.W.
dc.date.accessioned2020-11-25T07:27:59Z
dc.date.available2020-11-25T07:27:59Z
dc.date.issued2020en_US
dc.identifier.citationYuksel, M., Pennings, J.R., Bayansal, F., Yeow, J.T.W. (2020). Effect of B-doping on the morphological, structural and optical properties of SILAR deposited CuO films. Physica B: Condensed Matter, 599, art. no. 412578. https://doi.org/10.1016/j.physb.2020.412578en_US
dc.identifier.urihttps://hdl.handle.net/20.500.12508/1392
dc.identifier.urihttps://doi.org/10.1016/j.physb.2020.412578
dc.description.abstractHerein the deposition and characterization of CuO films with various doping concentrations of boron through the application of the SILAR method are performed. Structural, morphological, and optical properties of the films are determined by SEM with EDS, XRD, and UV/Vis spectroscopy. EDS analysis proved the boron contributions in the films. SEM images showed that boron-doping has a decreasing effect on particle size i.e. the thickness and the length of the nanostructures decreased from 45 to 30 and from 224 to 150 nm, respectively. XRD analyses demonstrated that the crystallite size of the films increased from 12.9 to 15.9 nm with increasing boron concentration which is evidence for increased crystallinity. UV/Vis spectroscopy analysis demonstrated that band gap energy value effectively decreased by boron doping.en_US
dc.language.isoengen_US
dc.publisherElsevieren_US
dc.relation.isversionof10.1016/j.physb.2020.412578en_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectCuOen_US
dc.subjectNanostructureen_US
dc.subjectBoron-dopingen_US
dc.subjectSILAR methoden_US
dc.subject.classificationPhysics
dc.subject.classificationCondensed Matter
dc.subject.classificationCupric Oxide | Lithium-ion Batteries | Electrochemical Capacitors
dc.subject.otherThin-films
dc.subject.otherMagnetic-properties
dc.subject.otherBoron
dc.subject.otherConductivity
dc.subject.otherDependence
dc.subject.otherEnergy
dc.subject.otherBoron
dc.subject.otherCopper oxides
dc.subject.otherCrystallinity
dc.subject.otherCrystallite size
dc.subject.otherEnergy gap
dc.subject.otherOptical properties
dc.subject.otherParticle size
dc.subject.otherParticle size analysis
dc.subject.otherSemiconductor doping
dc.subject.otherUltraviolet visible spectroscopy
dc.subject.otherX ray diffraction
dc.subject.otherBand gap energy
dc.subject.otherBoron concentrations
dc.subject.otherBoron-doping
dc.subject.otherDecreasing effect
dc.subject.otherDoping concentration
dc.subject.otherEDS analysis
dc.subject.otherStructural and optical properties
dc.subject.otherUV/ Vis spectroscopy
dc.subject.otherOptical films
dc.titleEffect of B-doping on the morphological, structural and optical properties of SILAR deposited CuO filmsen_US
dc.typearticleen_US
dc.relation.journalPhysica B: Condensed Matteren_US
dc.contributor.departmentMühendislik ve Doğa Bilimleri Fakültesi -- Metalurji ve Malzeme Mühendisliği Bölümüen_US
dc.identifier.volume599en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.contributor.isteauthorBayansal, Fatih
dc.relation.indexWeb of Science - Scopusen_US
dc.relation.indexWeb of Science Core Collection - Science Citation Index Expanded


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