Effect of B-doping on the morphological, structural and optical properties of SILAR deposited CuO films
Citation
Yuksel, M., Pennings, J.R., Bayansal, F., Yeow, J.T.W. (2020). Effect of B-doping on the morphological, structural and optical properties of SILAR deposited CuO films. Physica B: Condensed Matter, 599, art. no. 412578. https://doi.org/10.1016/j.physb.2020.412578Abstract
Herein the deposition and characterization of CuO films with various doping concentrations of boron through the application of the SILAR method are performed. Structural, morphological, and optical properties of the films are determined by SEM with EDS, XRD, and UV/Vis spectroscopy. EDS analysis proved the boron contributions in the films. SEM images showed that boron-doping has a decreasing effect on particle size i.e. the thickness and the length of the nanostructures decreased from 45 to 30 and from 224 to 150 nm, respectively. XRD analyses demonstrated that the crystallite size of the films increased from 12.9 to 15.9 nm with increasing boron concentration which is evidence for increased crystallinity. UV/Vis spectroscopy analysis demonstrated that band gap energy value effectively decreased by boron doping.
